Tags :Calibre 2009

Mentor Graphics Corporation (NASDAQ: MENT) today announced that the Calibre® nmLVS product now provides comprehensive support for the iLVS interoperable rule specification used by TSMC for new design kits. This allows customers to define and customize complex IC design rules, as needed, while maintaining compliance with TSMC specifications and allowing seamless adoption of EDA vendor performance optimizations. The iLVS specification, which was co-developed by Mentor, TSMC and several other EDA partners, separates the rule definition syntax from underlying rule implementations. This allows Mentor to optimize the underlying implementation, reducing the need for users to tune the general rule specifications themselves. Moreover, by using iLVS in conjunction with the Calibre nmLVS Advanced Device Properties (ADP) facility, the Calibre tool users can...

Mentor Graphics Calibre 2009.3_15 Linux Release! Calibre® is the overwhelming market share leader and the industry standard for IC physical verification, due to the outstanding performance, accuracy and reliability of Calibre products. Over the last two years, Calibre nmDRC™ has reduced average DRC runtime by a factor of five, while Calibre\’s innovative Hyperscaling and MTFlex™ technologies have cut memory requirements in half. Calibre nmDRC also reduced overall cycle time with incremental DRC, which allows designers to make DRC runs in parallel. As DRC violations are reported, designers can immediately fix and recheck just the affected areas, while the initial DRC run continues. To handle complex and multi-variate, multi-dimensional checks that are not adequately addressed by traditional design rules, Calibre nmDRC\’s...

WILSONVILLE, OR–(Marketwire – May 27, 2010) – Mentor Graphics Corporation (NASDAQ: MENT) today announced that the Calibre® nmLVS product now provides comprehensive support for the iLVS interoperable rule specification used by TSMC for new design kits. This allows customers to define and customize complex IC design rules, as needed, while maintaining compliance with TSMC specifications and allowing seamless adoption of EDA vendor performance optimizations. The iLVS specification, which was co-developed by Mentor and TSMC, separates the rule definition syntax from underlying rule implementations. This allows Mentor to optimize the underlying implementation, reducing the need for users to tune the general rule specifications themselves. Moreover, by using iLVS in conjunction with the Calibre nmLVS Advanced Device Properties (ADP) facility, the Calibre...