Tags :Calibre v2010.2.38.2

Mentor Graphics Corporation (Nasdaq: MENT) today announced the availability of Calibre® xRC™ and Calibre xL rule decks for TSMC’s advanced 65nm process node. These rule decks provide advanced modeling capabilities including process sensitivity, and self and mutual inductance. Calibre now provides a solution for many types of integrated circuit designs including analog, digital, mixed signal, and memory. For nanometer designs, accurate simulation and analysis requires more than traditional resistance and capacitance. Designers need a post-layout silicon model that incorporates inductance, process sensitivity effects, and efficient accounting of effects not captured in the device model. Using Calibre xRC and Calibre xL in the design flow helps ensure that designers have all the data they need to obtain successful first pass silicon....